Base Bench 63
|Base Bench 63|
Base Bench 63
|Material Processed||All Materials|
|Chemicals Used||MF 319, AZ 300, AZ 400K, AZ 726, Microposit Developer|
This wet bench is used for working with bases, mostly developers for developing photoresist on samples. For more information on developing and Lithography please see the Lithography training session. Processing is done in beakers that are stored on the shelf next to the bench. There are other automated tools such as the ACS 200 cluster tool and the CEE Developer 1 and CEE Developer 2 that are more efficient and reproducible for developing photoresist.
- Please collect developers in Hazardous waste bottles instead of aspirating.
- Waste bottles are stored in the middle shelf of the base cabinet in 1440C
- If there are no partial waste bottles available, grab a new one from the recycle bin and label it
This bench contains a quench tank, aspirator and a sink. The bench has room for leaving samples for extended soak (up to 48 hours).
|Warning:||You must use the buddy system for all chemical processing. No processing if you are alone in the lab. If the yellow warning lights are on it means that there are 2 or 1 people in the lab.|
Working with chemicals can be very dangerous. To minimize the chance of accident, make sure you always:
- Wear personal protective equipment. Required PPE at this bench is an apron, face shield, and Trionic gloves.
- LNF Glove Policy
- Know the properties and hazards of chemicals you are working with. If you don’t know, find out by reading about them or asking staff.
- Plan the details of your process. Before you start working, plan what quantities of chemicals and sample carriers you will use. Plan how you will rinse your sample and what you will do with any waste generated. Make sure you know how the controllers work.
- Do not use this bench without proper training.
- Waste from this bench goes into the LNF’s acid waste neutralization system and then to city sewers.
- No solvents can be used or disposed of here.
- Solutions which contains toxic materials that cannot be removed by neutralization (such as TMAH) should not be aspirated or disposed of down the drain.
- Pieces to 6" substrates
- Up to 5" mask plates
The Base Bench 63 is designated as a Metals class tool. Below is a list of approved materials for the tool. Approved means the material is allowed in the tool under normal circumstances. If a material is not listed, please create a helpdesk ticket or email firstname.lastname@example.org for any material requests or questions.
LNF Standard Processes in this bench
- Positive photoresist developing
- KMPR which utilizes positive resist developers
- Supported Resists:
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Standard operating procedure
This article 's SOP does not follow the LNF Equipment Manual Guidelines.
If you want to reference the powerpoint/ reader friendly version available at the bench it is here
The word doc version is seen below. Widget text will go here.
Checkout on Base Bench 63 requires the following steps:
- Take the General Wet Bench Training, if you haven't already.
- Read through this page and the Standard Operating Procedure above.
- Practice with your mentor or another authorized user until you are comfortable with tool operation.
- Complete the Base Bench Quiz.
- Open a helpdesk ticket and request a checkout. Please specify the process and the size of your sample.
- A tool engineer will schedule a time for checkout.
- If you pass the quiz the tool engineer will authorize you on the tool. If not you will be contacted to repeat.
If there is a problem with the bench, please create a helpdesk ticket