Base Bench 63

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Base Bench 63
Base Bench 63
Equipment Details
Technology Wet bench
Materials Restriction Metals
Material Processed All Materials
Sample Size Unrestricted
Chemicals Used MF 319, AZ 300, AZ 400K, AZ 726, Microposit Developer
Equipment Manual
Overview System Overview
Operating Procedure SOP
Supported Processes Processes

This wet bench is used for working with bases, mostly developers for developing photoresist on samples. For more information on developing and Lithography please see the Lithography training session. Processing is done in beakers that are stored on the shelf next to the bench. There are other automated tools such as the ACS 200 cluster tool and the CEE Developer 1 and CEE Developer 2 that are more efficient and reproducible for developing photoresist.


  • It is required to collect all liquid waste generated at this bench; please see the Hazardous waste page
  • Partially-filled waste bottles are stored on the bottom shelf of the chemical passthrough in 1440C
  • If there are no partially-filled waste bottles available, grab an empty bottle from the recycling bin and label it

System overview

Chemicals allowed

Hardware details

This bench contains a quench tank, aspirator and a sink. The bench has room for leaving samples for extended soak (up to 48 hours).


Proper PPE for this bench are apron, trionic gloves and safety glasses
Warning Warning: You must use the buddy system for all chemical processing. No processing if you are alone in the lab. If the yellow warning lights are on it means that there are 2 or 1 people in the lab.

Working with chemicals can be very dangerous. To minimize the chance of accident, make sure you always:

  • Wear personal protective equipment. Required PPE at this bench is an apron, face shield, and Trionic gloves.
  • LNF Glove Policy
  • Know the properties and hazards of chemicals you are working with. If you don’t know, find out by reading about them or asking staff.
  • Plan the details of your process. Before you start working, plan what quantities of chemicals and sample carriers you will use. Plan how you will rinse your sample and what you will do with any waste generated. Make sure you know how the controllers work.
  • Do not use this bench without proper training.
  • Waste from this bench goes into the LNF’s acid waste neutralization system and then to city sewers.
    • No solvents can be used or disposed of here.
    • Solutions which contains toxic materials that cannot be removed by neutralization (such as TMAH) should not be aspirated or disposed of down the drain.

Substrate requirements

  • Pieces to 6" substrates
  • Up to 5" mask plates

Material restrictions

The Base Bench 63 is designated as a Metals class tool. Below is a list of approved materials for the tool. Approved means the material is allowed in the tool under normal circumstances. If a material is not listed, please create a helpdesk ticket or email for any material requests or questions.

Supported processes

LNF Standard Processes in this bench

It is strongly recommended that the CEE developer stations be used for mask plate developing.

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Standard operating procedure

If you want to reference the powerpoint/ reader friendly version available at the bench it is here

The word doc version is seen below. Widget text will go here.

Checkout procedure

Checkout on Base Bench 63 requires the following steps:

  1. Take the General Wet Bench Training, if you haven't already.
  2. Read through this page and the Standard Operating Procedure above.
  3. Fill out the Base Bench Process Request Form
  4. Practice with your mentor or another authorized user until you are comfortable with tool operation.
    1. If your mentor is not an authorized user or you do not know of an authorized user that can train you, proceed to the next step.
  5. Score 100% on this quiz: Base Bench Training Quiz.
  6. Open a helpdesk ticket and request a checkout.
  7. A tool engineer will schedule a time for checkout.
  8. If you pass the quiz the tool engineer will authorize you on the tool.


If there is a problem with the bench, please create a helpdesk ticket