Octafluorocyclobutane

C₄F₈ is used for RIE processes as SiO₂ etching and as a passivation agent.

Equipment

• STS Pegasus 4
• STS Pegasus 6
• STS Glass Etcher
• P5000 RIE
• LAM 9400

Safety Data Sheet

• SDS

References

• Wikipedia Page