CEE 100CB photoresist spinner
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CEE 100CB photoresist spinner | |
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Equipment Details | |
Technology | Lithography |
Materials Restriction | General |
Material Processed | Photoresist |
Sample Size | pieces up to 6" wafers |
Chemicals Used | Acetone, IPA |
Equipment Manual | |
Overview | System Overview |
Operating Procedure | SOP |
Supported Processes | Supported Processes |
Maintenance | Maintenance |
The CEE 100CB has been decommissioned. Please use the Spinner CEE Apogee.