CEE 100CB photoresist spinner
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| CEE 100CB photoresist spinner | |
|---|---|
 | |
| Equipment Details | |
| Technology | Lithography |
| Materials Restriction | General |
| Material Processed | Photoresist |
| Sample Size | pieces up to 6" wafers |
| Chemicals Used | Acetone, IPA |
| Equipment Manual | |
| Overview | System Overview |
| Operating Procedure | SOP |
| Supported Processes | Supported Processes |
| Maintenance | Maintenance |
The CEE 100CB has been decommissioned. Please use the Spinner CEE Apogee.
