CEE 100CB photoresist spinner

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CEE 100CB photoresist spinner
Equipment Details
Technology Lithography
Materials Restriction General
Material Processed Photoresist
Sample Size pieces up to 6" wafers
Chemicals Used Acetone, IPA
Equipment Manual
Overview System Overview
Operating Procedure SOP
Supported Processes Supported Processes
Maintenance Maintenance

The CEE 100CB has been decommissioned. Please use the Spinner CEE Apogee.