Indium gallium zinc oxide
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Indium gallium zinc oxide | |
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Material Details | |
Material Restriction | Undefined |
Indium gallium zinc oxide (IGZO) is a semiconducting material, consisting of the elements: indium (In), gallium (Ga), zinc (Zn) and oxygen (O).
Contents
Applications
- IGZO's has an advantage over zinc oxide in that it can be deposited in a more uniform amorphous phase. It can also retain high carrier mobility
- It has often been used for thin film transistors (TFTs) in which it is the backplane of flat-panel displays
- Often used in liquid-crystal displays (LCDs) and organic light-emitting diodes (OLEDs)
Processing Equipment
Process technologies that can be used to deposit/pattern this material. If this is a substrate, refer to what tool/process restrictions there may be and possibly remove the following sub-sections.
Deposition Equipment
- List of equipment for depositing this material
Etching Equipment
- List of equipment for etching/pattering this material
Processes
- List of chemical (or otherwise) processes for this material
References
- Citations/references for this material