Indium gallium zinc oxide

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Indium gallium zinc oxide
Material Details
Material Restriction Undefined



Indium gallium zinc oxide (IGZO) is a semiconducting material, consisting of the elements: indium (In), gallium (Ga), zinc (Zn) and oxygen (O).

Applications

  • IGZO's has an advantage over zinc oxide in that it can be deposited in a more uniform amorphous phase. It can also retain high carrier mobility
  • It has often been used for thin film transistors (TFTs) in which it is the backplane of flat-panel displays
  • Often used in liquid-crystal displays (LCDs) and organic light-emitting diodes (OLEDs)

Processing Equipment

Process technologies that can be used to deposit/pattern this material. If this is a substrate, refer to what tool/process restrictions there may be and possibly remove the following sub-sections.

Deposition Equipment

  • List of equipment for depositing this material

Etching Equipment

  • List of equipment for etching/pattering this material

Processes

  • List of chemical (or otherwise) processes for this material

References

  • Citations/references for this material