LAM 9400/Processes

The LAM 9400 has a variety of processes available. There are standard supported recipes for poly, oxide and nitride, although there are many more materials etched via user created recipes.

Proccess List

• LAM 9400/Processes/mnf_oxide1

  A SiO₂ etch

• LAM 9400/Processes/mnf_oxynite2

  A etch designed to etch oxide and nitride at similar rates

• LAM 9400/Processes/mnf_nitride1

  An etch designed to be selective to oxide

• LAM 9400/Processes/LNF_Poly

  An etch designed for polysilicon

• LAM 9400/Processes/Bell_Poly

  An etch designed for polysilicon with a SiO2 mask

• LAM 9400/Processes/LNF_Ti_thin
• LAM 9400/Processes/LNF_Aluminum
• LAM 9400/Processes/LNF_Al2O3
• LAM 9400/Processes/LNF_TiN_sel_Al2O3
• LAM 9400/Processes/LNF_HfO2
• LAM 9400/Processes/mnf_parylene_fast_iso
• LAM 9400/Processes/mnf_parylene_slow_iso
• LAM 9400/Processes/LNF_GaAs_HBr
• LAM 9400/Processes/Moly_HBr_O2
• LAM 9400/Processes/BARC_1