MF 319
((#allow-groups:user}} MIF 319 is a developer that is used for positive photoresist. It is used in high resolution semiconductor fabrication. MIF 319 is Tetramethylammonium hydroxide (TMAH) based.
Contents
Equipment
MIF 319 is used on:
Hazards
There are many hazards associated with working with MIF 319
Chemicals
The following chemicals make up MIF 319:
- Water CAS# 7732-18-5
- Surfactant
- Tetramethyl ammonium hydroxide CAS# 75-59-2
Properties
MIF 319 has the following properties:
- form: liquid
- colour: colourless
- odour: amines
Safety
MIF 319 is an alkaline liquid and vapor. Can cause skin, eye, and respiratory irritation. Please read over the SDS for any further information. Always handle MIF 319 when wearing Trionic gloves. Any chemical containing TMAH should not be disposed of down the drain and should be collected for Hazardous waste.
Hazardous Waste
AZ 319 should not go down the drain It should be collected in Hazardous waste bottles.
