P5000 RIE/Processes

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This page lists the processes supported by the LNF for the P5000 RIE.

Process List

• OXIDE BKM

  Standard process for etching silicon dioxide. This process can be performed on Chamber A and Chamber B.

• NITRIDE BKM

  Standard process for etching silicon nitride. This process can be performed on Chamber A and Chamber B.

• POLY PAT BKM

  Standard process for etching polysilicon. This process can be performed on Chamber C.