RCA Bench 81

RCA Bench 81
RCA 81
Equipment Details
Technology	Wet bench
Materials Restriction	Semi-Clean
Material Processed	silicon, fused silica, glass
Sample Size	4" standard, some other sizes may be accommodated
Chemicals Used	Ammonium hydroxide, Hydrogen peroxide, Hydrofluoric acid, Hydrochloric acid
Equipment Manual
Overview	System Overview
Operating Procedure	SOP
Supported Processes	RCA Clean
Maintenance	Maintenance

RCA Bench 81 is used for RCA Cleaning non-CMOS-clean samples. The RCA clean is a 3-stage method of cleaning Si wafers and is effective at removing organic and ionic surface contaminants.

RCA (Radio Corporation of America) Cleaning was developed for cleaning wafers prior to high temperature processing.

There is a tank for RCA-1, RCA-2, and dilute HF.

Capabilities

This wet bench is used for RCA cleaning samples which 1) do not need to go into the furnaces, or 2) have been been through the non-CMOS-clean processes of chemical mechanical polishing, Potassium Hydroxide/ KOH Etch, or AZ 400K developer, and which need to go back into furnaces.

RCA1/ Standard Clean 1/ SC1/ organic clean is a 5:1:1 mixture of water, ammonium hydroxide, and hydrogen peroxide. This etch is used to clean the organic particles from your wafers. This works by oxidizing the samples so that the particles will come off. After going through the organic clean, you will need to do a dilute HF dip to remove the oxides. See the SOP for details. The last step is to do RCA2/ Standard Clean 2/ SC2/ ionic clean is a 6:1:1 mixture of water, hydrochloric acid, and hydrogen peroxide. This clean is to remove the ionic contamination from the wafers.

System Overview

Chemicals Used

• Hydrogen peroxide (H₂O₂) (30%, CMOS grade)
• Ammonium hydroxide (NH₄OH) (29%, CMOS grade)
• Hydrochloric acid (HCl)(22-40%, CMOS grade)
• Hydrofluoric acid (HF) (49%, CMOS grade)

Hardware Details

This bench contains a heated tank for RCA SC-1, a heated tank for RCA SC-2, and an unheated tank for dilute HF.

Substrate Requirements

• Wafer Size: 4" standard, some other sizes may be accommodated
• Wafer type: silicon, fused silica, and glass allowed

Safety

Proper PPE for this bench are Trionic gloves, face shield, apron and safety glasses

Warning:

You must use the buddy system for all chemical processing. No processing if you are alone in the lab. If the yellow warning lights are on it means that there are 2 or 1 people in the lab.

Working with chemicals can be very dangerous. To minimize the chance of accident, make sure you always:

• Wear personal protective equipment.
• LNF Glove Policy
• Know the properties and hazards of chemicals you are working with. If you don’t know, find out by reading about them or asking staff.
• Plan the details of your process. Before you start working, plan what quantities of chemicals and sample carriers you will use. Plan how you will rinse your sample and what you will do with any waste generated. Make sure you know how the controllers work.
• Do not use this bench without proper training.
• There is one route of waste disposal from this bench: .
  • Water aspirator: Only water, acids and bases can be disposed of using this aspirator. Do not aspirate solvents with this aspirator.

Material Restrictions

Silicon, fused silica, and glass substrates are allowed in the bench. Metals, compound semiconductors, photoresists, and polymers are not allowed.

The RCA Bench 81 is designated as a Semi-Clean class tool. Below is a list of approved materials for the tool. Approved means the material is allowed in the tool under normal circumstances. If a material is not listed, please create a helpdesk ticket or email info@lnf.umich.edu for any material requests or questions.

Approved materials

Standard Operating Procedure

For a document version of the SOP, see here: Widget text will go here.

Checkout procedure

1. Take the General Wet Bench Training, if you haven't already.
2. Take Rise Online Training for RCA Cleaning
3. Read through this page and the Standard Operating Procedure above.
4. Practice with your mentor or another authorized user until you are comfortable with tool operation.
   1. If your mentor is not an authorized user or you do not know of an authorized user that can train you, proceed to the next step.
5. Score 100% on this quiz: RCA Bench 81 Training Quiz
6. Open a helpdesk ticket and request a checkout.
7. A tool engineer will schedule a time for checkout.
8. If you pass the quiz the tool engineer will authorize you on the tool.