Solvent Bench 14
| Solvent Bench 14 | |
|---|---|
 Solvent Bench 14 | |
| Equipment Details | |
| Technology | Wet bench |
| Materials Restriction | Metals |
| Material Processed | silicon and glass wafers |
| Sample Size | 4" and 6" |
| Chemicals Used | Remover PG, Acetone, IPA, 1165 |
| Equipment Manual | |
| Overview | System Overview |
| Operating Procedure | SOP |
| Supported Processes | Supported Processes |
| User Processes | User Processes |
| Maintenance | Maintenance[LNF_User:Solvent Bench 14_User_Processes|User Processes]] |
The Solvent 14 Bench is for working with solvents, for stripping resist, cleaning wafers, and Lift-off. It is considered a non CMOS-clean bench, so wafers with metal are allowed in the bench. It is intended for use with 4" and 6" Si and glass substrates only. If you need to use solvents to clean a CMOS-clean device, please make a Helpdesk ticket and staff can help to coordinate this.
Contents
System Overview
Chemicals Allowed
Hardware Details
This bench contains 2 heated ultrasonic baths, 2 hotplates with digital solution readout, a heated megasonic tank, DI Quick Dump Rinse tank (QDR), timers, and there are 2 aspirators on this bench, one goes to solvent waste, the other to the acid waste neutralization system.
Safety
 Warning: | You must use the buddy system for all chemical processing. No processing if you are alone in the lab. If the yellow warning lights are on it means that there are 2 or 1 people in the lab. |
Working with chemicals can be very dangerous. Many solvents are very carcinogenic so avoid contact and breathing the vapors. To minimize the chance of accident, make sure you always:
- Wear personal protective equipment. Required PPE at this bench are safety glasses and either Trionic or Neoprene gloves.
- LNF Glove Policy
- Know the properties and hazards of chemicals you are working with. If you don’t know, find out by reading about them or asking staff.
- Plan the details of your process. Before you start working, plan what quantities of chemicals and sample carriers you will use. Plan how you will rinse your sample and what you will do with any waste generated. Make sure you know how the controllers work.
- Only process 4” and 6” wafers.
- Do not use this bench without proper training.
- There are three routes of disposal from this bench:
- Solvent Aspirator: Only solvents can be disposed of using this aspirator. Do not aspirate water with this aspirator.
- Water Aspirator: Only water can be disposed of using this aspirator. Do not aspirate solvents with this aspirator.
- Solvent drain: Solvents can be poured down the solvent drain where they are collected in the basement. Do not pour water or non-solvents into this drain.
Substrate Requirements
- 4 and 6 inch wafers
- Glass and Silicon
Material Restrictions
The Solvent Bench 14 is designated as a Metals class tool. Below is a list of approved materials for the tool. Approved means the material is allowed in the tool under normal circumstances. If a material is not listed, please create a helpdesk ticket or email info@lnf.umich.edu for any material requests or questions.
Standard Operating Procedure
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Checkout Procedure
- Take the General Wet Bench Training, if you haven't already.
- Read through this page and the Standard Operating Procedure above.
- Fill out the Solvent Bench Process Request Form
- Practice with your mentor or another authorized user until you are comfortable with tool operation.
- If your mentor is not an authorized user or you do not know of an authorized user that can train you, proceed to the next step.
- Score 100% on this quiz: Cleanroom Solvent Bench quiz.
- Open a helpdesk ticket and request a checkout.
- A tool engineer will schedule a time for checkout.
- If you pass the quiz the tool engineer will authorize you on the tool.
Maintenance
Benches are checked twice a week during lab clean. The solvent drain filter is cleaned out then.
