Solvent Bench 94
|Solvent Bench 94|
Solvent Bench 94
|Material Processed||SU-8, PDMS, photoresist|
|Chemicals Used||Acetone, Isopropano, Methanol, Xylene, SU-8 Developer, Remover PG.|
|Supported Processes||Supported Processes|
Solvent Bench 94 is located in the ROBIN laboratory. It is mostly used for soft lithography, sample mounting and solvent cleaning. For working with PDMS or SU-8, curing samples, or applying release agent, this bench should be reserved. The reservation of this bench allows exclusive use of the Solvent Bay and the tools located there (i.e., the Laurell Spinner, hot plates, vacuum jars for degassing PDMS and release agent coating), except for the Dimatix Ink Jet printer and Lindbergh Convection Oven. Numerous user-specific processes also take place in Solvent Bench 94.
- 1 Announcements
- 2 SU-8 2050 and 2100, Polyimide 2610 and 2611, and PDMS Available for Solvent 94 users in the LNF Store
- 3 Capabilities
- 4 System Overview
- 5 Supported Processes
- 6 Standard Operating Procedure
- 7 Checkout Procedure
- 8 Maintenance
- Please remember to wear an extra eye protection (mask) when danger of splashing when handling liquids. Masks are available on all benches.
- We recommend to spin SU-8 and other photoresist without covering the bowl with clean room towels in order to obtain reproducible thicknesses. Make sure you change the Al foil after spinning is done
SU-8 2050 and 2100, Polyimide 2610 and 2611, and PDMS Available for Solvent 94 users in the LNF Store
Solvent 94 users have access to SU-8 2050, SU-8 2100, Polyimide 2610 and 2611 via the LNF Store. SU-8 2050 and 2100 are sold in 50 gram allotments while PI 2610 and 2611 are sold in 100 gram allotments. The photoresist is packaged in wide-mount bottles to make it easy to pour without forming bubbles. Private bottles are stored in the photoresist cabinet adjacent to the fume hood.
PDMS (Sylgard 184) kits are also available for purchase in the LNF Store. Kits are delivered and stored in the private PDMS cabinet adjacent to the fume hood.
Large bottles of SU-8 2002, 2005, and 2010 are available as a shared supply for all users.
- SU-8 photolithography
- Photoresist coating for dicing
- Polyimide processing
- Remover PG hot bath for wafer soaking/cleaning
- PDMS processing
- Release agent coating
- Solvent sample cleaning
- Wax removal
- Other user-designed processes, with staff approval
- Spinning of non-standard materials
- Isopropanol bath
- SU-8 developer bath
- Hot plate with Remover PG bath
- DI rinse tank
- Squirt bottles with acetone, IPA, Xylene, SU-8 developper, methanol, ecoclear
- N2 and DI guns
- The Laurell Spinner is interlocked together with Solvent Bench 94. Reserving Solvent Bench 94 is needed to use spinner.
- Reserving Solvent Bench 94 also reserves the hot plates in the exhausted enclosure
- Two wafer-type hot plates in laminar hood
- 12"x12" programmable hot plate in laminar hood
- One wafer type Hot plate for dehydration on top of bench
- Two 12"x12" hot plates exclusively dedicated to PDMS curing. One of these hot plates MUST be maintained at 80°C or below
- Standard hot plate that can be placed inside the bench is the process calls for it
- Vacuum desiccators
- Vacuum desiccator for PDMS degassing
- Vacuum desiccator for release agent coating
- Scale and Precision Scale
Most materials (semiconductors, metals, polymers, etc) are allowed at this bench. Some materials which have special hazards or incompatibilities (toxic, contain nanoparticles, corrosive) may be prohibited. All new materials must be approved by staff.
The Solvent Bench 94 is designated as a Metals class tool. Below is a list of approved materials for the tool. Approved means the material is allowed in the tool under normal circumstances. If a material is not listed, please create a helpdesk ticket or email firstname.lastname@example.org for any material requests or questions.
This bench supports all the soft lithography processes: SU-8 lithography , PDMS preparation and release agent deposition. It is also used for general solvent cleaning, especially to clean samples that have been mounted for lapping or polishing. These processes are described in more detail on the Processes page.
In addition to these, this tool has a number of user-created recipes for etching a wide variety of materials. Some of these recipes are documented on Solvent Bench 94 User Processes. If you are curious to know if your material can be processed in this tool, please contact the tool engineers via the helpdesk ticket system.
Standard Operating Procedure
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- Read through this page and the Standard Operating Procedure above for the standard processes.
- Create a Helpdesk Ticket requesting training.
- A tool engineer will schedule a time for initial training.
- If the process you are interested is not a standard process you will need to work with a tool engineer on an SOP
- Practice with your mentor or another authorized user until you are comfortable with tool operation if the process has been established.
- Schedule a checkout session with a tool engineer via the helpdesk ticket system. If this checkout is successful, the engineer will authorize you on the tool.
Acetone, Isopropanol and SU-8 developer tanks are changed or topped up by staff during lab cleans. The beaker of Remover PG is typically kept on the hotplate and changed when necessary.
Solvent squirt bottles are also filled during lab cleans, but users are allowed to fill them as well.
When the solvent waste collection bottle is full, users are required to change the bottle. Unscrew the funnel from the top of the bottle, and attach it to an empty solvent bottle. Cap the full bottle, and write "Solvent Waste" on the new bottle using permanent marker. Solvent should not go down the drain ever. Squirt bottles should also be refilled by users if needed.