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LAM 9400/Processes/LNF Poly

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LNF_Poly is designed for etching si and polysilicon in the LAM 9400. This recipe is currently under development and will replace poly_etch_2 as it does not have the same stability problems.
==Etch Rates==
*Si - 2800 Å/min
*SPR 220 (3.0) - 275 Å/min
*SiO<sub>2</sub> - 150 Å/min
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==Parameters==
{| class="wikitable" border="1" style="text-align: center"
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==Capabilities=====Etch Rate=== ===Mask Selectivity=== ===Sidewall Profile===
[[File:LAM_9400_LNF_Poly_2um_grating.jpg|400px]]
==Limitations==
OnlineAccess, PhysicalAccess, Staff, StoreManager, StoreUser, Bureaucrats, Interface administrators, Administrators, Widget editors
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