Jump to navigation Jump to search

Plasma etching

189 bytes added, 6 years ago
{{main|Ion milling}}
<!--stuff about Ion milling uses an ion milling-->beam (typically [[argon]]) to [[sputtering|sputter]] material from the surface of the sample. It has very low selectivity (typically 1:1) but can be used on any material, even [[inert metal]]s. The LNF currently does not have any ion milling capabilities.
LabUser, OnlineAccess, PhysicalAccess, Staff, StoreManager, StoreUser, Bureaucrats, Interface administrators, Administrators, Widget editors


Navigation menu