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Plasma etching

189 bytes added, 6 years ago
{{main|Ion milling}}
<!--stuff about Ion milling uses an ion milling-->beam (typically [[argon]]) to [[sputtering|sputter]] material from the surface of the sample. It has very low selectivity (typically 1:1) but can be used on any material, even [[inert metal]]s. The LNF currently does not have any ion milling capabilities.
==Equipment==
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