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Physical vapor deposition

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[[{{PAGENAME}}|Physical vapor deposition (PVD)]] is a type of deposition where source materials are transformed into a vapor or plasma using a physical process (typically heating or physical bombardment.) The vapor then moves towards a substrate where it condenses on the substrate surface.
More details: LNF Technology seminar: PVD February 27, 2015: *[http://leccap.engin.umich.edu/leccap/viewer/r/EQfS99 Video video recording] *and [https://umich.box.com/s/8cy227xts0yhcq0jnoll4kffh3k60rni Complete complete slides]
==Technologies==
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==Further reading==
* LNF Technology seminar: PVD February 27, 2015: [http://leccap.engin.umich.edu/leccap/viewer/r/EQfS99 Video video recording] and [https://umich.box.com/s/8cy227xts0yhcq0jnoll4kffh3k60rni complete slides]
; Basic Overviews of PVD and Thin Film technology:
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