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Confocal laser optical profilometry

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==Method of operation==
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*This technique is based on confocal microscope configuration using high numerical aperture objectives which have a very narrow depth of focus. Only the "in focus" reflected light passes through the confocal pinhole.
*A laser is scanned in X/Y across field of view on the sample surface.
==Applications==
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*Confocal laser optical profilometry can be used for measuring surface roughness, sample topography, etched pattern step heights, and feature sizes.
*This technique and [[Scanning white light interferometry|scanning white light interferometry]] (SWLI) are particularly useful for characterizing the depth of high aspect ratio trench features which can not be measured using stylus profilometry. [Stylus profilometry] is only capable of a maximum aspect ratio of ~1 (or less depending on feature size) and a maximum step height of 150um due to physical dimensions and limitations of the stylus.
==Equipment==
===Olympus OLS 4000 LEXT===
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{{main|Olympus OLS 4000 LEXT}}
==Further reading==
* [http://www.olympus-ims.com/en/metrology/ols/]
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