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==Applications==
*Spectroscopic reflectometry provides a quick and easy method for measuring thin film thicknesses. Coupled with an automated mapping stage, this technology is the preferred method for collecting multi-site maps of film thickness on samples to analyze within sample thickness variation.
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==Method of operation==
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*Spectroscopic reflectometry analyzes the intensity versus wavelength of light reflected from a sample to extract thickness of thin films on the sample.
*Spectroscopic reflectometry can only solve for layer thicknesses for one layer or up to a stack of three layers.
*If the optical properties of a material need to be measured, [[Ellipsometry|spectroscopic ellipsometry]] is the measurement technology that is needed.
==Applications==
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*Spectroscopic reflectometry provides a quick and easy method for measuring thin film thicknesses. Coupled with an automated mapping stage, this technology is the preferred method for collecting multi-site maps of film thickness on samples to analyze within sample thickness variation.
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