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Deposition

285 bytes added, 6 years ago
| Better quality oxide/nitride dep where substrate can handle higher temp
|-
''| Growth????? - INCLUDE IN LPCVD?
| MainlyDielectrics
| 0.1-100 Å/sec
| 600-1200ºC
| Isotropic - very good sidewall coverage
| Very Good
| Very Low
| Very Good
| 1-10nm
| Best quality oxide/nitride dep where substrate can handle higher temp and slower dep rate
|-'''''Bold text'''
| [[Electroplating|ECD/Plating]]
| Conductive Materials
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