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{{main|Chemical vapor deposition}}
{{missing information|Parylene deposition}}
In [[Chemical vapor deposition]] (CVD) consists of the a substrate being is typically heated and exposed to one or more gaseous precursors, which react and/or decompose on the substrate surface to produce the desired thin film material. There are many methods for enhancing the chemical reaction rates CVD can be used to grow high quality, uniform thin films of the precursorsvarious materials. The LNF has fourteen [[Low pressure chemical vapor deposition| Low Pressure CVD (LPCVD)]] furnace tubes and five [[Plasma enhanced chemical vapor deposition| Plasma Enhanced CVD (PECVD)]] chambers.


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