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{{main|Chemical vapor deposition}}
{{missing information|Parylene deposition}}
In [[chemical vapor deposition]] (CVD) a substrate is typically heated and exposed to one or more gaseous precursors, which react and/or decompose on the substrate surface to produce the desired thin film material. CVD can be used to grow high quality, uniform thin films of various materials. The LNF has fourteen [[Low pressure chemical vapor deposition| Low Pressure CVD (LPCVD)]] furnace tubes for growing doped and undoped polysilicon, silicon dioxide, and silicon nitride. and five [[Plasma enhanced chemical vapor deposition| Plasma Enhanced CVD (PECVD)]] chambers.


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