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STS Pegasus 4/Processes

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* [[{{FULLPAGENAME}}/LNF Oxynitride LF]]
*: This recipe is for etching oxide and nitride. It is primarily useful for native oxide removal prior to a deep Si etch, but can also be used for definition of an oxide mask for etching.
*: {{note|There are significantly better tools for etching oxide and nitride that should be considered before using this recipe. Please create a helpdesk ticket or email [mailto:info@lnf.umich.edu info@lnf.umich.edu] if you have further questionquestions.}}
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