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|materials = [[Si]], [[SiO2|SiO<sub>2</sub>]]
|mask = [[Photoresist|PR]], [[SiO2|SiO<sub>2</sub>]]
|gases = [[ARAr]], [[CH4|CH<sub>4</sub>]], [[CHF3|CHF<sub>3</sub>]], [[CF4|CF<sub>4</sub>]],
[[H2|H<sub>2</sub>]], [[O2|O<sub>2</sub>]], [[SF6|SF<sub>6</sub>]]
|overview = [[{{PAGENAME}}#System_Overview | System Overview]]
** [[SF6|SF<sub>6</sub>]] - 52 sccm
* PECVD Gases
** [[ARCH4|CH<sub>4</sub>]]- sccm** [[CF4/O2|CF<sub>4</sub>]] - sccm** [[He]]- 1000 sccm ** [[N2|N<sub>2</sub>]] - sccm** [[N20|N<sub>2</sub>O]] - sccm** [[NH3|NH<sub>3</sub>]] - sccm** [[SiH4|SiH<sub>4</sub>]] - sccm
* Pressure
** RIE: 5 - 300 mTorr
** PECVD: 50 - 2000 mTorr
* Chuck
* Chamber* PECVD: Heated Platen: 200°C - 350°C * RF* * 400 W 13.56 MHz RF / Power SpecsSource
===Substrate Requirements===
