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Endeavor M1 AlN Sputter Tool

23 bytes added, 3 years ago
===Process Characterization===
====AlN Thickness ====
*AlN thickness is set in the recipe and the tool uses the target file data to determine the deposition rate.
**The Target file adjusts the deposition rate depending on the wear/age (KWhrs) of the target.
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====Stress Adjustment Unit====
*The stress adjustment unit is used to adjust a capacitance/resistance path to ground of the chamber.
**Users can adjust the dial before their runs.
====AlN Hysteresis:====
*Hysteresis is mapped to look at the N<sub>2</sub>/Ar ratios that produce a poisoned AlN state
**Users will want to run in the lower target voltage regime (AlN poisoned mode.)
LabUser, OnlineAccess, PhysicalAccess, Staff, StoreManager, StoreUser
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