*AlN thickness is set in the recipe and the tool uses the target file data to determine the deposition rate.
**The Target file adjusts the deposition rate depending on the wear/age (KWhrs) of the target.
Stress Adjustment Unit
*The stress adjustment unit is used to adjust a capacitance/resistance path to ground of the chamber.
**Users can adjust the dial before their runs.
*Hysteresis is mapped to look at the N<sub>2</sub>/Ar ratios that produce a poisoned AlN state
**Users will want to run in the lower target voltage regime (AlN poisoned mode.)