Changes

Jump to navigation Jump to search

Sputter deposition

142 bytes added, 3 years ago
{{main|PVD 75 Proline}}
*Materials deposited: [[Al2O3|Al<sub>2</sub>O<sub>3</sub>]], [[Aluminum|Al]], [[Chromium|Cr]], [[Copper|Cu]], [[Silicon|Si]], [[Silicon Dioxide|SiO<sub>2</sub>]], [[Silicon Nitride|Si<sub>3</sub>N<sub>4</sub>]], [[Nickel|Ni]], [[Silver|Ag]], [[Titanium|Ti]]
*The PVD 75 tool is designed specifically for '''point of use processingof materials not allowed or not currently in the Lab 18 tools.''' It is an open loop (non-loadlocked) tool with easier-to-change targets. Qualified users can change targets when they vent the chamber to load their samples.
==See also==
LabUser, OnlineAccess, PhysicalAccess, Staff, StoreManager, StoreUser
904

edits

Navigation menu