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Reactive ion etching

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==Equipment==
Below is a general description of the RIE equipment at the LNF. For a complete list, please see [[:Category:RIE equipment|list of RIE equipment]].
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===P5000 RIE===
{{main|P5000 RIE}}
{{main|Plasmatherm 790}}
The Plasmatherm is configured with a variety of gases so that it can etch a wide array of materials. Most recipes tend to have slow etch rates on the order of 200 Å/min which is ideal for very thin films. The tool also has few material restrictions to allow it to process as many things as possible.
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===Complete tool list===
<categorytree mode=pages>RIE equipment</categorytree>
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