Changes

Jump to navigation Jump to search

Reactive ion etching

1 byte removed, 2 years ago
no edit summary
==Equipment==
Below is a general description of the RIE equipment at the LNF. For a complete list, please see [[:Category:RIE equipment|list of RIE equipment]].
<onlyinclude>===P5000 RIE===
{{main|P5000 RIE}}
The P5000 is a 3 chamber tool designed for production etching. Chambers A and B are configured for SiO<sub>2</sub> and Si<sub>3</sub>N<sub>4</sub> etching, where as chamber C is configured for [[polysilicon]] and amorphous silicon etching. Chambers B and C are restricted to [[CMOS clean]] devices where as chamber A is open to [[semi-clean]] devices.
LabUser, OnlineAccess, PhysicalAccess, Staff, StoreManager, StoreUser, Bureaucrats, Interface administrators, Administrators, Widget editors
2,495

edits

Navigation menu