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Reactive ion etching

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Below is a general description of the RIE equipment at the LNF. For a complete list, please see [[:Category:RIE equipment|list of RIE equipment]].
<onlyinclude>===P5000 RIE===
{{main|P5000 RIE}}
The P5000 is a 3 chamber tool designed for production etching. Chambers A and B are configured for SiO<sub>2</sub> and Si<sub>3</sub>N<sub>4</sub> etching, where as chamber C is configured for [[polysilicon]] and amorphous silicon etching. Chambers B and C are restricted to [[CMOS clean]] devices where as chamber A is open to [[semi-clean]] devices.
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