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Optical lithography

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==Equipment==
===HMDS===
* [[ACS 200 cluster tool]] - HMDS is included in the standard spin processes in the ACS* [[Image Reversal Oven]] - Batch process small pieces up to 25 6" wafers.
===Photoresist Spinning===
** [[CEE Developer 2]]{{spaced ndash}}[[AZ 726]] and [[Microposit developer concentrate]]
* [[Base Bench 63]]{{spaced ndash}} Beaker development is useful for developing thick photoresist like [[KMPR]]
 
 
==Selection of type of optical lithography==
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