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Plasmatherm 790/Processes/L ox200

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Qualification This process is done qualified with a 5 minute min run, . The max allowed thickness of is 2µm. ==Qualification==<!-- Insert a description of how the process is qualified, generally this should include a chart to show the processes stability over time-->Occasionally L_ox200 is tested on a 100 mm Si wafer. The results can be seen below. {{expand section|need the chart}}
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