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[[{{PAGENAME}}|{{PAGENAME}}{{#if: {{#var:acronym}} | &nbsp;({{#var:acronym}})|}}]] is an optical 3D surface profiling technology.

==Method of operation==

*This technique is based on confocal microscope configuration using high numerical aperture objectives which have a very narrow depth of focus. Only the "in focus" reflected light passes through the confocal pinhole.

*A laser is scanned in X/Y across field of view on the sample surface.

==Applications==

*Confocal laser optical profilometry can be used for measuring surface roughness, sample topography, etched pattern step heights, and feature sizes.

*This technique and [[Scanning white light interferometry|scanning white light interferometry]] (SWLI) are particularly useful for characterizing the depth of high aspect ratio trench features which can not be measured using stylus profilometry. [Stylus profilometry] is only capable of a maximum aspect ratio of ~1 (or less depending on feature size) and a maximum step height of 150um due to physical dimensions and limitations of the stylus.

Optional description of materials that can be processed by technology. I think the best example of where this comes in handy would be with LPCVD describing the difference between HTO and LTO.

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