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Spectroscopic reflectometry

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{{lead too short}}
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[[{{PAGENAME}}|{{PAGENAME}}{{#if: {{#var:acronym}} | &nbsp;({{#var:acronym}})|}}]] (spectroscopic interferometry) is a technique used to measure the thickness of transparent and semi-transparent thin films.
==Equipment==
 
===NanoSpec 6100===
{{main|NanoSpec 6100}}
The NanoSpec 6100 analyzes normal incident reflected light from 400 to 800nm wavelength in order to extract thickness of thin films.
 
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==Method of operation==
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*Spectroscopic reflectometry analyzes the intensity versus wavelength of light reflected from a sample to extract thickness of thin films on the sample.
==Applications==
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*Spectroscopic reflectometry provides a quick and easy method for measuring thin film thicknesses. Coupled with an automated mapping stage, this technology is the preferred method for collecting multi-site maps of film thickness on samples to analyze within sample thickness variation.
Optional description of materials that can be processed by technology. I think the best example of where this comes in handy would be with LPCVD describing the difference between HTO and LTO.
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==Equipment==
 
===NanoSpec 6100===
{{main|NanoSpec 6100}}
The NanoSpec 6100 analyzes normal incident reflected light from 400 to 800nm wavelength in order to extract thickness of thin films.
<!--===Complete tool list===
<categorytree mode=pages>{{#var:acronym|{{PAGENAME}}}} equipment</categorytree>
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<!--==See also==
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