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Four point probe

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<!--|materials = %Optional materials processed%-->
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[[{{PAGENAME}}|{{PAGENAME}}{{#if: {{#var:acronym}} | &nbsp;({{#var:acronym}})|}}]] is used to measure resistive properties of semiconductor wafers and thin films. If the thickness of a thin film is known, the sheet resistance measured by four point probe can be used to calculate the resistivity of the material; conversely, if the material's resistivity is known, the thickness of the thin film can be calculated.
 
==Equipment==
<!--If this is a "main category" for equipment (i.e. you categorized that equipment page to be this technology), you should list the equipment here with a brief description of that tool's capabilities. Seriously, though, just check out the [[RIE]] page.
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===Miller FPP-5000 4-Point Probe===
{{main|Miller FPP-5000 4-Point Probe}}
 
 
<!--===Complete tool list===
<categorytree mode=pages>{{#var:acronym|{{PAGENAME}}}} equipment</categorytree>
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==Method of operation==
==Materials==
Optional description of materials that can be processed by technology. I think the best example of where this comes in handy would be with LPCVD describing the difference between HTO and LTO.
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==Equipment==
<!--If this is a "main category" for equipment (i.e. you categorized that equipment page to be this technology), you should list the equipment here with a brief description of that tool's capabilities. Seriously, though, just check out the [[RIE]] page.
-->
===Miller FPP-5000 4-Point Probe===
{{main|Miller FPP-5000 4-Point Probe}}
 
 
<!--===Complete tool list===
<categorytree mode=pages>{{#var:acronym|{{PAGENAME}}}} equipment</categorytree>
-->
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