Changes

Jump to navigation Jump to search

Aluminum

27 bytes added, 2 years ago
====[[Sputter_deposition|Sputter deposition]]====
Sputter deposition is a physical vapor deposition method of thin film deposition in which a high-purity source material (called a cathode or target) is subjected to a gas plasma (typically argon). The energetic atoms in this gas plasma collide with the target material and knock off source atoms which then travel to the substrate and condense into a thin film.
===Etch Processes=======[[Wet EtchingEtch|Wet Etch]]====
Wet etching can be used to etch aluminum using [[Aluminum Etch]]
OnlineAccess, PhysicalAccess, Staff, StoreManager, StoreUser
1,064

edits

Navigation menu