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Optical lithography

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==Figures of Merit==
The minimum feature resolution is generally a direct result of the type of resist, thickness, exposure time , and develop time.
===Defect Level===
The majority of defects in optical lithography are user created errors. It's necessary to pay close attention to '''every''' step of the process. A glove finger print may not show up initially on the wafer until the wafer is etched. A drop of acetone from the mist created by an acetone squirt bottle can destroy part of a pattern. Often it's possible to reduce both particulate and defects by using an automated tool such as the [[ACS 200 cluster tool]] to remove as much of the human skill needed as possible.
==See also==
OnlineAccess, PhysicalAccess, Staff, StoreManager, StoreUser, Bureaucrats, Interface administrators, Administrators, Widget editors


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