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Deposition

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===Physical vapor deposition (PVD)===
{{main|Physical vapor deposition}}
[[PVD|Physical vapor deposition (PVD)]] describes Physical vapor deposition (PVD) is a variety type of vacuum deposition methods used to deposit thin films by the condensation of where source materials are transformed into a vapor or plasma using a physical process (typically heating or bombardment.) The vapor then moves towards a substrate, usually in a vaporized form of vacuum, where it condenses on the desired film material onto various substratessubstrate surface.
===Thermal Oxidation===
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