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Parylene C

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==Processing Equipment==
===Deposition===
* [[SCS_PDS_2035CR]]
 
===Etching===
Similar to other polymers, parylene can be etched isotropically with an O<sub>2</sub> plasma.
* [[Plasmatherm 790]]
** [[Plasmatherm_790/Processes/m_pary1|m_pary1]]
** [[Plasmatherm_790/Processes/L_O2_DSM|L_O2_DSM]]
* [[LAM 9400]]
** [[LAM_9400/Processes/mnf_parylene_fast_iso|mnf_parylene_fast_iso]]
** [[LAM_9400/Processes/mnf_parylene_fast_iso|mnf_parylene_slow_iso]]
** rh_parylene
* [[STS Glass Etcher]]
* [[YES Plasma Stripper]]
* [[Deep UV SenLights PL16]]
== Equipment==
Parylene is deposited in the SCS PDS 2035 CR{{main|SCS PDS 2035CR}}
==Processing Notes==
*Parylene is stable over a very wide temperature range (-200 ‘C to +200 ‘C), allowing the chamber items coated in Parylene to be put in an autoclave
*Parylene is unaffected by solvents
==Processing Equipment==
===Deposition===
* [[SCS_PDS_2035CR]]
 
===Etching===
Similar to other polymers, parylene can be etched isotropically with an O<sub>2</sub> plasma.
* [[Plasmatherm 790]]
** [[Plasmatherm_790/Processes/m_pary1|m_pary1]]
** [[Plasmatherm_790/Processes/L_O2_DSM|L_O2_DSM]]
* [[LAM 9400]]
** [[LAM_9400/Processes/mnf_parylene_fast_iso|mnf_parylene_fast_iso]]
** [[LAM_9400/Processes/mnf_parylene_fast_iso|mnf_parylene_slow_iso]]
** rh_parylene
* [[STS Glass Etcher]]
* [[YES Plasma Stripper]]
* [[Deep UV SenLights PL16]]
==Technical data==
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