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SPR 220 7.0

1 byte added, 2 years ago
[[File:SPR_220_10um_thickness_vs_bake_time.png | 400px]]
A wafer was spun and the thickness was measured at intervals of 60 seconds using the [[NanoSpec 6100]]. After 6 minutes (360 seconds) the thickness of the photoresist stays the same indicating the solvents have been removed.
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