Changes

Jump to navigation Jump to search

Nickel

34 bytes removed, 2 years ago
===Deposition Equipment===
*Tools in the LNF for depositing this material.Evaporation** [[Angstrom Engineering Evoc Evovac Evaporator]]
** [[Cooke Evaporator]]
** [[SJ-20 Evaporator]]
*Sputtering
** [[PVD 75 Proline]]
===Etching Equipment===
*Tools in the LNF for etching this material.Wet Etching** [[Acid Bench 92]]** [[Acid Bench 12]]** [[Acid Bench 73]]* RIE** [[Nanoquest II Ion Mill]] 
===Characterization Equipment===
*Metrology/Characterization equipment available in the LNF for measuring physical, optical, and surface properties of this material.
==Processes==
===Deposition Processes===
* List of technologies for depositing this material and relevant process information specific to this material associated with this equipment/type of process.[[Electron beam evaporation]]* [[Sputter deposition]]
===Etching Processes===
* List of technologies for etchingNickel can be etched with [[Piranha Etch]] (380 nm/pattering this material and relevant process information specific to this material associated with this equipmentmin), dilute [[Aqua Regia]] (100 nm/type of process.min)*[[Plasma etching]]
===Characterization Processes===
==References==
*Citations[https:/references /drive.google.com/open?id=0B7eVu3mcqumAbTQ0aFBxXzYyNDg KR Williams, K Gupta, M Wasilik, "Etch Rates for this materialMicromachining Processing - Part II", review articlesJMEMS vol. If possible12 No 6, examples of users publications which includes the material.Dec 2003]
OnlineAccess, PhysicalAccess, Staff, StoreManager, StoreUser
1,064

edits

Navigation menu