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YES-CV200RFS(E)

222 bytes added, 2 years ago
==Supported Processes==
The tool is provided with 6 characterized recipes, shown in the table below. Three of these Process time is chosen on the main panel before starting the recipe. The original process times for recipes (31, 2, 5 and 6) 4 have variable times that you can change to suit your needsbeen included for reference. If you need process adjustment beyond this, please consult a tool engineer before creating a recipe to be authorized to edit recipes, and please do not save over the 6 supported recipes. There are 12 recipe slots in total, please save your recipe to one of 7-12. We cannot guarantee that it will be there for your next run, so remember to write down your settings.
{| class="wikitable" border="1" style="text-align: center"
! colspan="2" | Strip photoresist
! colspan="2" | Descum
! Strip KMPR
|-
! (prev) 3 μm !! any !! (prev) 200 Å !! any !! any
|-
! Recipe # !! 1 !! 2 !! 3 !! 4 !! 5!! 6
|-
| '''Time (sec)''' || (prev) 300 || (prev) 360 || var. || (prev) 20 || var. || var.
|-
| '''Chuck temp. (°C)''' || 60
| colspan="2" | 150
| colspan="2" | 60
| 150
|-
| '''O<sub>2</sub> flow (sccm)''' || 10050
| colspan="2" | 80
| colspan="2" | 35
| 80
|-
| '''NF<sub>3</sub> flow (sccm)''' || 0| colspan="2" | 0| colspan="2" | 0| 8|-| '''Power (W)''' || 1000800
| colspan="2" | 800
| colspan="2" | 100
| 800
|-
| '''Etch rate (Å/min)''' || N/A
| colspan="2" | 5000
| colspan="2" | 600
|
|-
| '''Uniformity (%)''' || N/A
| colspan="2" | 1.5
| colspan="2" | 20
|
|}
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