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Reactive ion etching

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In most reactors, DC bias is not controlled directly, but will depend on the conductance of the plasma and the power applied to the sample.
RIE can be used to etch a wide variety of materials, including dielectrics, semiconductors, polymers, and some metals. For information on etching specific materials, please review the sections below.
{{main|Dielectric plasma etching}}
not sure if I like where this is going... <I have to agree, I think you should save this for tool pages>
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