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|created = 10/10/2012
|modified =
|authors = Brian Vanderelzen}}</--
-->The '''{{SUBPAGENAME}}''' is a legacy recipe on the STS Pegasus 4 and 6 that may be used to etch [[silicon dioxide]] and [[silicon nitride]]. Because the tool is not designed for this process, it also etches [[silicon]] and [[photoresist]] at a similar rate. It is primarily useful for native oxide removal prior to a deep Si etch. For oxide film etching, such as preparing an etch mask, the [[STS Glass Etcher]] and [[P5000 RIE]] have far superior performance and are strongly recommended. It is not actively supported maintained by the LNF.
==Procedure==
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