Changes

Jump to navigation Jump to search

LAM 9400/Processes/LNF Al2O3

33 bytes added, 1 year ago
===Main Etch===
*ALD Al2O3Al<sub>2</sub>O<sub>3</sub>: 28 nm/min
*SPR: 29.6 nm/min
*PMMA: 73.4 nm/min
*ZEP: 49.4 nm/min
*SiO2SiO<sub>2</sub>: 48.4 nm/min
*GaN (N-Polar): 18.7 nm/min
*Aluminum: 88 nm/min
OnlineAccess, PhysicalAccess, Staff, StoreManager, StoreUser, Bureaucrats, Interface administrators, Administrators, Widget editors
2,126

edits

Navigation menu