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STS Pegasus 4/Processes/LNF Ar Descum

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<!-- Make sure to add any other relevant categories -->{{#ifeq: {{NAMESPACE}} | Template | | [[Category:Processes]]}}<!--{{warning|This page has not been released yet.}}-->{{Infobox process
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|modified = 7/25/2017
|authors = Kevin Owen
}}<!---->'''{{SUBPAGENAME}} ''' uses an Ar plasma to anisotropically and indiscriminately remove a thin layer of any material on the surface of the sample. It is intended as a combination of photoresist descum and native oxide removal prior to Si etching. This recipe is already included in all of the standard recipes.
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