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P5000 PECVD

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===Material Restrictions===
* High Purity Fused Silica wafers are allowed as long as they have been processed through a pre-furnace clean in the old RCA Clean Bench 81 in bay 1440A with an extended 1 minute 10:1 HF etch.
*Only the following metals are allowed as long as they have not been deposited in Lab18-01: aluminum, titanium, molybdenum, tantalum, tungsten, nickel, platinum, and chromium
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