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STS Pegasus 4

No change in size, 1 year ago
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* High selectivity to photoresist and [[SiO2|SiO<sub>2</sub>]]
==System Overviewoverview=====Hardware Detailsdetails===
** High Precision Fast Acting Chamber Mounted MFC's
** 30 A outer electromagnet
===Substrate Requirementsrequirements===
The {{PAGENAME}} is equipped to handle 4” (100 mm wafers) up to 3 mm thick. All smaller samples must be mounted to a carrier wafer. All standard major and minor flats and full-round wafers are allowed.
====Sample Mountingmounting====
{{see also | Sample mounting}}
For all standard (Bosch process) recipes, an SiO2 coated carrier is required, unless otherwise instructed by a tool engineer. For non-bosch process recipes, create a helpdesk ticket and staff will help you determine the appropriate material.
===Material Restrictionsrestrictions===
{{material restrictions}}
==Supported Processesprocesses==
In addition to these, this tool has a number of user-created recipes for specific processes. Some of these recipes are documented on [[LNF User:{{BASEPAGENAME}} User Processes|{{BASEPAGENAME}} User Processes]]. For more information, please contact the tool engineers via the helpdesk ticket system.
==Standard Operating Procedureoperating procedure==
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==Checkout Procedureprocedure==
Follow this procedure to receive authorization to run supported processes. Practicing with an authorized user or staff member prior to checkout is strongly encouraged.
LabUser, OnlineAccess, PhysicalAccess, Staff, StoreManager, StoreUser, Bureaucrats, Interface administrators, Administrators, Widget editors


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