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'''{{SUBPAGENAME}}''' is a single-step mixed-gas process intended for shallow silicon and thin film poly- and amorphous silicon etches.
{{note|The STS Pegasus is not designed for polysilicon etching. There are other tools at the LNF specifically designed for this, including the [[LAM 9400]] and the [[P5000 RIE]]. Please make a helpdesk ticket if you need assistance determining the correct tool or recipe for your process.|reminder}}
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