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STS Pegasus 4/Processes/LNF Recipe 1

No change in size, 1 year ago
Running recipe 1 for 20 minutes with 3 µm of [[SPR 220]] on a silicon wafer with our standard DRIE characterization mask can produce a profile like this.
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File:STS Pegasus_4_Recipe_1_2_um.jpg|Recipe 1 for 20 min, 2 µm Trench
File:STS Pegasus_4_Recipe_1_10_um.jpg|Recipe 1 for 20 min, 10 µm Trench
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