Changes
Jump to navigation
Jump to search
← Older edit
STS Pegasus 4/Processes/LNF Si Thinning 1
5 bytes added
,
2 years ago
no edit summary
|authors =
}}
'''{{SUBPAGENAME}}''' (previously known as '''LNF Si Thinning
Etch
''') is an SF<sub>6</sub> based process intended for isotropic thinning of Si wafers for device release. It does not have high uniformity, but has good selectivity to other materials.
==Procedure==
Kjvowen
LabUser, OnlineAccess, PhysicalAccess, Staff, StoreManager, StoreUser,
Bureaucrats
,
Interface administrators
,
Administrators
,
Widget editors
2,495
edits
Navigation menu
Personal tools
English
Log In
Namespaces
Page
Discussion
Variants
Views
Read
View source
View history
More
Search
Navigation
lnf.umich.edu
Main page
Announcements
Capabilities
User Resources
Safety
Recent changes
Random page
Help
Tools
Special pages
Printable version