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Nanoquest II Ion Mill

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|maintenance = [[{{PAGENAME}}#Maintenance | Maintenance]]
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The [[{{PAGENAME}}]] is aan ion beam etching (ion milling) system manufactured by Intlvac Thin Film Corporation.It is used for non-reactive, anisotropic etching of thin films particularly for difficult to etch materials.It is capable of etch rates from 2 to 40 nm per minute (material dependent).
==Announcements==
| style="text-align:left" | LNF_800VB_500IB_160VA || style="color: red;" | 25.4 || || 3.9%
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{{note|For all process questions, fill out the [https://docs.google.com/forms/d/e/1FAIpQLSf4FcYP1XIoE-scXpXtmaegIzceSVe3uaR8e9P3K3LQAvn20w/viewform process request form] and create a helpdesk ticket.|reminder}}
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