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YES-CV200RFS(E)

282 bytes removed, 1 year ago
==System overview==
===Hardware Detailsdetails===
* Downstream RF plasma: up to 1000 W
* Heated chuck: 30°C – 200°C
==Standard operating procedure==
<!-- To include a document from google docs, use the line below, replace "googledocid" with the ID for the document. Remember, to make this visible, you must set Sharing for the document to "Anyone with the link can view". -->The operating system can be found in the complete user manual, found '''[https://docsdrive.google.com/documentfile/d/1BIA91s15C-1ja4j1KIjTy3KRzyjeq0Fjywk2CdsCTtA10HJbxRzMlYwAw6onGxglvg99YJ9GDhmE/preview hereview?usp=sharing PDF Copy].''' <!--{{#widget:GoogleDoc|key=1GzEZMMOQftr7JyJfj8uesD_3cbGWVE3AN4Rg6y9DbKI1BIA91s15C-1ja4j1KIjTy3KRzyjeq0Fjywk2CdsCTtA}}-->
==Checkout procedure==
==Maintenance==
* A leak check and plasma clean is performed monthly* The chamber is disassembled and cleaned once per quarter and process condition is verified.twice a year
===User authorized maintenance===
The only maintenance that users are authorized to perform is tool startup in the event of a power bump. Please see the [https://docs.google.com/document/d/13gVIzr2tf87rtDnioNH-qU8P1Vk_1km3w7d9oy-PnRA/preview Startup and Shutdown Procedure] for more details.
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