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The Oxford Plasmalab System 100 is a 100 mm [[reactive ion etching]] tool designed for a variety of etches. It’s an ICP based etcher designed to etch pieces mounted to a 100 mm wafer. The diameter of the source only allows it to uniformly etch the center ~1.5” of the wafer, making it perfect for pieces. With a variety of gases and a cryo chuck it is ideal for anisotropic [[polymer]] etching, [[Compound semiconductor|III-V's]] and a variety of other materials.