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Plasma etching is a form of [[plasma processing]] designed to [[etching|remove]] material from a sample using plasma discharges. It is highly controllable and can be used to etch a wide variety of materials. The most commonly used form of plasma etching is referred to in the microfabrication world as [[reactive ion etching]] (RIE). However, there are other types of plasma etching, including [[plasma ashing]] and [[ion milling]]. For a detailed overview of plasma etching in the LNF, please review the [https://docsdrive.google.com/a/lnf.umich.edu/file/d/0B76AgohVTgqdamFiaE1mRk9mVmM/preview ?usp=sharing&resourcekey=0-yGk7A8kAmb0kQArcKPNlTQ Tech Talk]