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AZ 12XT

4 bytes removed, 1 year ago
*Develop on the CEE Develop stations using 726 DP 60-60
*Hard Bake
**For wet etching or platting a hard bake at 110°C is recommendedfor 1 minute.
*Removal
**For thickness <17um spins removal as normal. (ash, PRS-2000, nanostrip)
LabUser, OnlineAccess, PhysicalAccess, Staff, StoreManager, StoreUser
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